Lab4MEMS II

Micro-Optical MEMS, micro-mirros and pico-projectors

 

1st Lab4MEMS2 Workshop 2016

Next-Generation Optical MEMS Technologies and Devices Workshop

Lausanne September 12, 2016 


The Next-Generation Optical MEMS Technologies and Devices Workshop focused on a next-generation of MOEMS technologies and devices, global trends in the MOEMS fields, future applications, MOEMS device processes, design, methodology and manufacturing. The invited presentations were given by top level speakers from the key industry in the sector (e.g. ST Microelectronics), research institutes and academia. The workshop also gave the unique opportunity to meet with high level experts from the MEMS and MOEMS areas, to look into the news from industry and exchange ideas.

The constant miniaturization of devices and, at the same time, the need for advanced and improved functionalities are an important driving factor for the development of new technologies with a high level of integration. In this frame the Lab4MEMS II project was established. The project is an ENIAC  Joint Undertaking involving 19 industrial, research and academic partners under the lead of STMicroelectronics. Its final goal is the setup of a pilot line for innovative Micro-Opto-Electro-Mechanical-Systems (MOEMS) by developing and combining several of the Key Enabling Technologies (KET) as indicated by the High Level Group - namely nanotechnology, micro-electronics and advanced packaging. Following a More-Than-Moore approach on novel technologies Lab4MEMS II focuses on the development, test and validation of devices such as pico-projectors, 3D infrared scanners and near-infrared micro-spectrometers. The success of the project will open the way to the worldwide commercialization of future applications such as contactless commanding of devices, holographic imaging and smart driving.

The attendees received a diploma confirming participation to the workshop.

Important Dates:               

  • Workshop date:  Monday 12 September 2016,
  • Time: 12:40 – 17:30     

Venue:

Swisstech Convention Centre:

Quartier Nord de l'EPFL                                       

Route Louis-Favre 2

CH - 1024 Ecublens, Switzerland

Covered topics included the following among other related to the Next-Generation Optical MEMS Technologies and Devices :

  • MOEMS/MEMS global and next future scenarios  
  • Innovative materials for MOEMS devices
  • Non-linear mechanical behavior of  electrostatically actuated micromirrors
  • Application and control of the MOEMS microscanners
  • Concepts for optical microsystems (MOEMS) and their miniaturization limits
  • Integration issue in MEMS/MOEMS technologies in Industry 4.0 era

Speakers - MOEMS/MEMS experts:

  • Luca Zanotti (ST Microelectronics, Italy)
  • Piotr Grabiec (Instytut Technologii Elektronowej, Poland)
  • Claudia Wiemer (MDM, IMM-CNR, Italy)
  • Attilio Frangi (Politecnico Di Milano, Italy)
  • Teodor Gotszalk (WEMiF Wroclaw University of Technolgy, Poland)
  • Hans Peter Herzig (EPFL, Switzerland)

Invited presentations:

  • MOEMS global and next future scenarios, Luca Zanotti (ST Microelectronics, Italy)
  • Innovative materials for MOEMS devices, Claudia Wiemer (MDM, IMM-CNR, Italy)
  • Non-linear mechanical behavior of  electrostatically actuated micromirrors, Attilio Frangi (Politecnico Di Milano, Italy)
  • Application and control of the MOEMS microscanners, Teodor Gotszalk (WEMiF Wroclaw University of Technolgy, Poland)
  • Concepts for optical microsystems (MOEMS) and their miniaturization limits, Hans Peter Herzig (EPFL, Switzerland)
  • Integration issue in MEMS/MOEMS technologies in Industry 4.0 era, Piotr Grabiec (Instytut Technologii Elektronowej, Poland)

Online Workshop Registration:

Workshop Organizers:

On-line information:

 

Download Workshop information materials.

 
 

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